PAS5500/750F DUV步進掃描系統(tǒng)使用成熟的248nmKrF技術,可以實現(xiàn)130nm的大規(guī)模生產(chǎn)。它結合了改進的0.7NA 4倍還原鏡頭的成像能力與調(diào)平系統(tǒng)中的多點創(chuàng)新,以及空中II照明技術,包括類星體、多極照明和可選的多重曝光能力。該系統(tǒng)配備了TTL對齊和ATHENA,以提高后端工藝層的對齊精度,配備了一個小于25nm的長期單機覆蓋。
步進掃描光刻機PAS 5500-750C進一步減少開銷時間,并結合提高客戶作業(yè)的生產(chǎn)率,提供了130片/h晶圓(200毫米)的生產(chǎn)吞吐量。應用2kHz20WKrF激光器可以獲得的操作成本。
特點與優(yōu)勢:
Variable, 0.7 NA Deep UV Projection Lens
Production resolution down to 130 nm.
Step and Scan
Large field size, better CD control and lower lens aberrations.
AERIAL II Illumination with QUASAR and Optional Multiple Exposure Capability
Provides the ultimate flexibility in illumination modes at maximum throughput.
PAS 5500 Step-and-Scan Body
Commonality with i-line and 193-nm Step-and-Scan tools for economic mix-and-match.
8-Spot Level Sensor
Improved focus and leveling under production conditions.
ATHENA Advanced Alignment
Increased alignment accuracy process latitude.
Includes 2kHz 20W KrF Laser Technology with VariableLaser Frequency Control
The perfect combination of high laser power for high throughput and efficient use of laser pulses for
the lowest possible laser Cost of Operation.