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日本YAMATO等離子清洗機(jī)PR500/510

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產(chǎn)品型號(hào)PR500/PR510

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日本YAMATO等離子清洗機(jī)PR500/510：

Gas Plasma Etcher
PR500/PR510
Model
500 510
Method
Barrel type of DP
DP : direct plasma
High-frequency Output
Max.500W
Oscillating Frequency
13.56MHz
Reaction Chamber
?215×305mm

The PR500/510 isagasplasma device that is used widely for such applicationsasproductionof semiconductors and analysis work. Itboastsoutstandingoperability and safety, with an automatic tuningsystemas a standardcomponent and other features.

  • It has a compact design,withasmall-size HF generator and an oscillation sectionintegratedwitha portion of the chamber.
  • With the 215mm diameterlargecaliberchamber, the unit can process bigtestingsamples.


*The gas plasmaequipment has a wide range ofapplications fromashing, etching,dry cleaning,etc.


* Reaction Chamber Control Panel

PR500 Reaction Chamber
* Withthe215mm diameter large caliberchamber


* FORWARD/REFLECT indicatebydigital


* Operation Flowchart
Piping System Diagram


Specifications
Model PR500 PR510
*Method Barrel type of direct plasma
* Controlpart
Highfrequency output Max.500W
Oscillating frequency 13.56MHz
Outputimpedance 50Ω
Tuningmethod Automatic tuning
Instrument Output watt meter (0 to 600W)
Reflected wave watt meter (0 to 300W)
Vacuum gauge, thermocouple type
Flow meter, needle valve integrated type, 2 sets
Timer 0.1sec. to 999h
Gasinlet 1/4"stainless steel, 2 inlet
Powersource (50/60Hz) AC100/220V, single phase, 2 kVA
* Reactionpart
Reactionchamber Madeof quarts, φ215×305mm
Electrodestructure Condenser type, 4-way split
Controlsystem Autopressurereduction, auto leak valve TouchpanelwithPLC control
Pipingmaterial SUS,Teflon
Externaldimensions(W×D×Hmm) 438×520×760 520×630×760
Weight Approx.38kg Approx.60kg
* StandardAccessories
  • Connection cable :1completeset
  • Vacuum grease : 1 pc.
  • O-ring for reaction chamber:1pc.
* OptionalAccessories
* Frame for wafers, 2, 3,4,5, 6 inches * Multipurposeangledframe
* Aluminum etchingtunnel*Stand

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